AZoM on MSN5mon
Beta-Phase Gallium Oxide Films Using Plasma-Enhanced Atomic Layer Deposition (PEALD) at 200°C
This study presents a novel approach to depositing crystalline β-Ga₂O₃ films at low temperatures (as low as 200°C) using ...
AZOM1y
Layerava PEALD/ALE—A Versatile HCP-ALD System
Layerava is a PEALD + Thermal ALD platform. In addition to thermal energy, plasma offers an additional energy source for ALD surface reactions. With the addition of different neutral radicals and ion ...