最后，对于中芯国际面临的技术瓶颈，王国辉承认，中国目前确实无法获得 ASML 的 EUV 光刻机，而这些设备是在尖端节点上生产芯片所需的。然而 ...
IT之家 2 月 1 日消息，ASML 总裁兼首席执行官 Christophe Fouquet 在上月末的公司 2024 年第四季度财报电话会议上表示，该企业的首台第二代 0.55 (High) NA EUV 光刻机 TWINSCAN ...
Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...
Samsung Electronics has reportedly launched a new EUV Task Force (TF) to enhance its extreme ultraviolet (EUV) technology and improve yields for advanced nodes like 3nm processes. In contrast ...
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