This allows for positioning of evaporation sources outside of the reactor tube spatially separating the functions of evaporation and transport, thus leading to precise control over the deposition ...

Chemical Vapor Deposition (CVD) is a widely used technique in materials science, particularly in the fabrication of thin films and coatings, as well as the synthesis of advanced materials. It involves ...

This updated version of the popular handbook further explains all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through ...

Researchers have developed an innovative technology in plasma spraying-physical vapor deposition known as alternating vapor/liquid phase deposition. By adjusting the arc current, researchers can ...