Atomic layer etching (ALE) is the reverse of atomic layer deposition (ALD). ALE can be achieved using sequential, self-limiting thermal reactions. We have recently demonstrated Al 2 O 3 ALE [1-3] and ...

It also allows for the precise control of composition and doping levels in the deposited films. Atomic Layer Deposition is a special type of CVD that involves sequential, self-limiting surface ...

ALD offers a number of advantages, all of which arise from the self-limiting, sequential reactions. First, while deposition is not exactly a single atomic layer per cycle, film thickness is well ...