the FlexAL atomic layer deposition (ALD) system provides a wide range of optimized high-quality plasma ALD and thermal ALD procedures. The ALD product line includes a variety of instruments to satisfy ...

1 Hot wall viscous flow reactors for routine growth and etching without in situ probing techniques. One of these reactors can accommodate 6” wafers. 1 Plasma ALD reactor equipped with an in situ ...

Plasma LCFA were measured by gas-liquid chromatography in 2 groups of children aged 4 to 16 years with AD: group A: 13 boys diagnosed as adrenoleucodystrophy (ALD)on the basis of associated ...

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Additionally, research on low-temperature SiNx deposition using very high frequency (VHF) plasma-enhanced ALD demonstrated that using a floating multi-tile electrode can enhance film properties.

ASM Microchemistry F-120 with QCM and QMS One of the eight F-120 reactors is equipped with a quartz crystal microbalance and quadrupole mass spectrometer for ALD reaction mechanims studies. Beneq TFS ...

The Fiji is a modular high-vacuum ALD system that accommodates a wide range of deposition modes using a flexible system architecture and multiple configurations of precursors and plasma gases. The ...

Researchers at the University at Albany’s College of Nanotechnology, Science, and Engineering now have access to a new fabrication system capable of manipulating microchip designs at the atomic level.

An exploratory objective assessed VK0214's effects on plasma levels of very long-chain fatty acids (VLCFAs), the biomarkers ...

The new machine, known as a plasma-enhanced atomic layer deposition machine, or PE-ALD tool, is made by a British company called Oxford Instruments Plasma Technology. Computer chips are made ...

PE-ALD stands for Plasma Enhanced Atomic Layer Deposition and describes the process by which molecular layers of material can be added or removed from microchips while being manufactured.